Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Reexamination Certificate
2002-02-27
2008-10-21
Meeks, Timothy (Department: 1792)
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
C427S248100, C427S250000, C427S255230, C427S576000, C204S192120, C204S192160
Reexamination Certificate
active
07438955
ABSTRACT:
A procedure for the synthesis of titanium nitride (TiN) thin films on metal substrate by vapor deposition using a magnetized sheet plasma source is disclosed. TiN films on metal substrate exhibiting the stoichiometric TiN and Ti2N were synthesized in a mixed N2/Ar plasma with initial gas filing ratio of preferably 1:3 under the following conditions: total initial gas filing pressure of at least about 40 mTorr, plasma current in the range of about 2A to 3A and plasma discharge potential in the range of about 125V to about 150V.
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Meeks Timothy
Ohlandt Greeley Ruggiero & Perle L.L.P.
Philippine Council for Advanced Science and Technology Research
Stouffer Kelly M
University of the Philippines Diliman
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