Time-optimal setpoint generator in a lithographic apparatus

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

Reexamination Certificate

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C700S063000, C700S121000

Reexamination Certificate

active

07341822

ABSTRACT:
The present invention discloses a lithographic apparatus, a device manufacturing method, and a robotics system capable of specifying a trajectory to be followed by a substrate relative to a radiation beam comprising a position and/or an orientation as a function of time. The specified trajectory is characterized as a mathematical smooth function up to at least the third order which connects a first state and a second state, wherein both the first state and the second state comprise boundary values for at least the position and/or the orientation and for first and second derivatives of the position and/or orientation.

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English translation of Japanese Office Action issued in Japanese Patent Application No. 2004-047979 mailed Jan. 26, 2007.

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