Three layer waveguide for thin film lens fabrication

Details Three layer waveguide for thin film lens fabrication Three layer waveguide for thin film lens fabrication

1977-08-05

1979-02-27

Corbin, John K.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156643, 204192P, G02B 514

Patent

active

041416210

ABSTRACT:
In thin film optical systems including thin film optical waveguides, of such materials as Nb.sub.2 O.sub.5, it is desirable to fabricate thin film lenses. One of the types of lenses which can be made is the step-in-thickness type. This type of thin-film lens can be fabricated by plasma etching through a photoresist mask in such materials as Nb.sub.2 O.sub.5 and Ta.sub.2 O.sub.5. Plasma etching yields an etch wall with smooth steep sides which is important for good quality thin-film lenses; however, the etch rate is too variable for reproducible etch depth based upon etch time, and the bottom of the etch is very rough, causing excessive scattering loss. It has been found that a sandwich-like structure of Nb.sub.2 O.sub.5, TiO.sub.2 and Nb.sub.2 O.sub.5 provides an improved arrangement in that a good control of the etch depth and a smooth flat bottom in the etch areas have been achieved by introducing the layer of TiO.sub.2 as an etch stop.

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