Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1996-10-09
1998-12-22
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430905, 522 31, G03F 7004
Patent
active
058517286
ABSTRACT:
A three-component chemical amplified photoresist composition, comprising: an alkali soluble resin; a dissolution inhibitor of aromatic polyhydroxy compound substituted by at least two acid-decomposable radicals; and a photo acid generating agent of an onium salt, which is capable of forming good profiles when exposed to light with a short wavelength and is superior in heat resistance and storage stability.
REFERENCES:
patent: 5677103 (1997-10-01), Kim et al.
Kim Ki-Dae
Kim Seong-Ju
Park Joo-Hyeon
Seo Dong-Chui
Chu John S.
Korea Kumho Petrochemical Co. Ltd.
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