Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2010-06-15
2011-12-20
Chu, John (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S326000, C430S910000
Reexamination Certificate
active
08080365
ABSTRACT:
To provide a thiopyran derivative, having a structure expressed by the following general formula 1:where X is O or S; R1is —H, —CH3, C2-4 alkyl group, thioether group, or ketone group; R2is —H, —CH3, or trifluoromethyl group; and R1and R2may be identical to or different from each other.
REFERENCES:
patent: 2003/0215736 (2003-11-01), Oberlander et al.
patent: 2005/0049325 (2005-03-01), Chisholm et al.
patent: 2005/0049376 (2005-03-01), Chisholm et al.
patent: 2005/0214674 (2005-09-01), Sui et al.
patent: 2008/0009647 (2008-01-01), Hatakeyama et al.
patent: 09-110790 (1997-04-01), None
patent: 2005-133071 (2005-05-01), None
patent: 2006-089412 (2006-04-01), None
patent: 2006-033359 (2006-03-01), None
International Search Report of PCT/JP2007/074128, Mailing Date of Jan. 22, 2008.
Blakey et al, “Novel High-Index Resists for 193 nm Immersion Lithography and Beyond”, Proc. of SPIE, 2007, p. 651909-1-9, vol. 6519, cited in spec.
J. Heijboer et al, “Study of the Molecular Movement of Oxa- and Thiacyclohexyl Rings in Solid Polymers by Mechanical Measurements over a Broad Frequency Range”, Journal of Macromolecular Science—Physics, Jun. 1971, p. 375-392, cited in spec.
Chu John
Fujitsu Limited
Westerman Hattori Daniels & Adrian LLP
LandOfFree
Thiopyran derivative, polymer, resist composition, and... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Thiopyran derivative, polymer, resist composition, and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thiopyran derivative, polymer, resist composition, and... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4270702