Thin metal oxide film and process for producing the same

Details Thin metal oxide film and process for producing the same Thin metal oxide film and process for producing the same

2006-11-07

2006-11-07

Wilczewski, Mary (Department: 2822)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

C438S785000, C438S798000

Reexamination Certificate

active

07132373

ABSTRACT:
The present invention provides a method for producing a crystalline metal oxide thin film by first depositing a substantially amorphous metal oxide film, and thereafter, as a post treatment, exposing the film to low temperature plasma in a high frequency electric field at 180° C. or less, and the crystalline metal oxide thin film produced by this method. Because the producing method according to the present invention allows a dense and homogenous crystalline metal oxide thin film to be formed onto a substrate at a low temperature without requiring active heat treatment, a metal oxide thin film having desirable characteristics can be formed without damaging the characteristics of a substrate even if the substrate has comparatively low heat resistance.

REFERENCES:
patent: 5593737 (1997-01-01), Meinzer et al.
patent: 5631664 (1997-05-01), Adachi et al.
patent: 6378153 (2002-04-01), Morgan
patent: 6432725 (2002-08-01), Lian et al.
patent: 2002/0063537 (2002-05-01), Nam et al.
patent: 2003/0218153 (2003-11-01), Abe
patent: 401069512 (1989-03-01), None
patent: 2-283022 (1990-11-01), None
patent: 4-149090 (1992-05-01), None
patent: 4-199828 (1992-07-01), None
patent: 06-172990 (1994-06-01), None
patent: 07-086165 (1995-03-01), None
patent: 07-224384 (1995-08-01), None
patent: 7-294861 (1995-11-01), None
patent: 9-64307 (1997-03-01), None
patent: 9-153491 (1997-06-01), None
patent: 9-246477 (1997-09-01), None
patent: 9-262466 (1997-10-01), None
patent: 10-233489 (1998-09-01), None
patent: 10-273317 (1998-10-01), None
patent: 11-145148 (1999-05-01), None
patent: 2000-86242 (2000-03-01), None
patent: 2000-200899 (2000-07-01), None
patent: 2001-31681 (2001-02-01), None
patent: 2001-85639 (2001-03-01), None
patent: 2001-133466 (2001-05-01), None
patent: 2001-148377 (2001-05-01), None
patent: 2001-152339 (2001-06-01), None

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