Thin layer of hafnium oxide and deposit process

Details Thin layer of hafnium oxide and deposit process Thin layer of hafnium oxide and deposit process

2007-03-20

2007-03-20

Meeks, Timothy (Department: 1762)

Coating processes

Optical element produced

C427S255310, C427S255700, C427S419300, C427S374200, C427S398100

Reexamination Certificate

active

10607912

ABSTRACT:
A thin layer of hafnium oxide or stacking of thin layers comprising hafnium oxide layers for producing surface treatments of optical components, or optical components, in which at least one layer of hafnium oxide is in amorphous form and has a density less than 8 gm/cm3. The layer is formed by depositing on a substrate without energy input to the substrate.

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