Thin-film transistor type photosensor

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S059000, C257S072000, C257S291000, C257S436000, C257S448000, C257S459000, C257SE31085, C257SE31124, C257SE29117, C257SE29120, C257SE31125

Reexamination Certificate

active

07851836

ABSTRACT:
A photosensor includes a semiconductor thin film for photoelectric conversion having a first side portion and a second side portion. A source electrode extends in the longitudinal direction of the semiconductor thin film and has a side edge portion that overlaps the first side portion of the semiconductor thin film, and a drain electrode extends in the longitudinal direction and has a side edge portion that overlaps the second side portion of the semiconductor thin film. At least one of the side edge portions of the source and drain electrodes has protruding portions which are arranged along the longitudinal direction and which overlap the semiconductor thin film, and notched portions formed between the protruding portions. An ohmic contact layer is formed between the semiconductor thin film and the protruding portions of the at least one of the side edge portions of the source and drain electrodes.

REFERENCES:
patent: 5302987 (1994-04-01), Kanemori et al.
patent: 6670595 (2003-12-01), Sasaki et al.
patent: 2005/0041168 (2005-02-01), Jang et al.
patent: 2006/0124828 (2006-06-01), Shin
patent: 2008/0129942 (2008-06-01), Shin
patent: 0 449 598 (1991-10-01), None
patent: 8-213584 (1996-08-01), None
Gadelrab. S. M. et al “Performance of Photo-Transistors With Thin (50 NM) a-Si:H Layers” Amorphous Silicon Technology 1995. San Francisco, Apr. 18-21, 1995; (MRS Symposium Proceedings), Pittsburgh, MRS, US, vol. 377, Apr. 18, 1995, pp. 713-718, XP000656369, ISBN: 978-1-55899-280-1.
English Language International Search Report and Written Opinion dated Jul. 18, 2008 issued in counterpart Appln. No. PCT/JP2007/074587.

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