Thin film transistor substrate and method of manufacture

Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Amorphous semiconductor material

Reexamination Certificate

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Details

C257S072000, C257SE27001

Reexamination Certificate

active

07928437

ABSTRACT:
A thin film transistor (“TFT”) substrate in which the size of a pixel TFT formed in a display area is reduced using a single slit mask, and the length of the channel area of a protection TFT constituting an electrostatic discharge protection circuit formed in a non-display area is formed larger than that of the pixel TFT using the same mask pattern. The TFT substrate includes a signal line and a discharge line formed on a substrate, a signal supply pad formed on one end of the signal line to supply a signal to the signal line, and an electrostatic discharge protection circuit including at least one protection TFT including a plurality of channels formed between the signal supply pad and the discharge line and/or between the signal line and the discharge line.

REFERENCES:
patent: 6825497 (2004-11-01), Lai
patent: 6838700 (2005-01-01), Trainor et al.
patent: 6972819 (2005-12-01), Lee et al.
patent: 7005707 (2006-02-01), Lai
patent: 7532265 (2009-05-01), Tsai et al.
patent: 7551240 (2009-06-01), Tsai et al.
patent: 7629614 (2009-12-01), Liao
patent: 2002/0038893 (2002-04-01), Wong
patent: 2003/0030054 (2003-02-01), Hector et al.
patent: 2005/0224793 (2005-10-01), Chang et al.
patent: 2006/0038181 (2006-02-01), Tseng
patent: 2004-342923 (2004-12-01), None
patent: 1020060019270 (2006-03-01), None
patent: 1020060080761 (2006-07-01), None
Machine Translation of KR 10-2006-0019270.

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