Thin-film transistor, method for manufacturing thin-film...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer

Reexamination Certificate

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Details

C438S151000, C438S166000

Reexamination Certificate

active

07485505

ABSTRACT:
The present invention provides a thin-film transistor offering a higher electron (or hole) mobility, a method for manufacturing the thin-film transistor, and a display using the thin-film transistor. The present invention provides a thin-film transistor having a source region, a channel region, and a drain region in a semiconductor thin film with a crystal grown in a horizontal direction, the thin-film transistor having a gate insulating film and a gate electrode over the channel region, wherein a drain edge of the drain region which is adjacent to the channel region is formed in the vicinity of a crystal growth end position.

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patent: 7226817 (2007-06-01), Tanada et al.
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patent: 1 047 119 (2000-10-01), None
patent: 2002-83768 (2002-03-01), None
patent: 2002-83769 (2002-03-01), None
Masakiyo Matsumura, “Preparation of Ultra-Large Grain Silicon Thin-Films by Excimer-Laser”, Journal of the Surface Science Society of Japan, vol. 21, No. 5, May 2000, pp. 278-287.
Masakiyo Matsumura, “Method of Forming Large Crystal Grain Si Film by Excimer Laser Light Irradiation”, Applied Physics, vol. 71, No. 5, 2000, pp. 543-547.

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