Thin film transistor having LDD region and process for...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S258000, C257S443000, C257S911000

Reexamination Certificate

active

07098492

ABSTRACT:
A thin film transistor display includes a driving circuit and an active matrix. The driving circuit comprises a first thin film transistor structure. The first thin film transistor structure includes a first gate, source and drain regions, a first LDD region, a second LDD region and a first channel region between the first and the second LDD regions. The first gate region is disposed over the first channel region, and partially or completely overlies the first and the second LDD regions. The active matrix is controlled by the driving circuit and comprises a second thin film transistor structure. The second thin film transistor structure includes a second gate, source and drain regions, a third LDD region, a fourth LDD region and a second channel region between the third and the fourth LDD regions. The second gate region is disposed over the second channel region and substantially overlaps with neither of the first and the second LDD regions.

REFERENCES:
patent: 5789283 (1998-08-01), Park
patent: 6071762 (2000-06-01), Wu et al.
patent: 6165876 (2000-12-01), Yamazaki et al.
patent: 6211533 (2001-04-01), Byun et al.
patent: 6281552 (2001-08-01), Kawasaki et al.
patent: 6284577 (2001-09-01), Suzawa et al.
patent: 6909117 (2005-06-01), Ohnuma
patent: 2001-326364 (2001-11-01), None
patent: 2001-352073 (2001-12-01), None

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