Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Amorphous semiconductor material
Patent
1996-03-01
1998-10-13
Whitehead, Carl W.
Active solid-state devices (e.g., transistors, solid-state diode
Non-single crystal, or recrystallized, semiconductor...
Amorphous semiconductor material
257 60, 257 59, 257266, 257331, 257365, 257366, H01L 2904, H01L 2976
Patent
active
058215603
ABSTRACT:
A thin film transistor which includes an insulation base, first and second gate electrodes, first and second insulation layers, an active layer of semiconductor material, a source electrode and a drain electrode, in which a lateral length of the first gate electrode is narrower than a lateral length of the second gate electrode. Also, the first gate is electrically insulated from the active layer of semiconductor material by the first insulation layer so that the drain current saturates in a high drain voltage region.
REFERENCES:
patent: 5495119 (1996-02-01), Ikeuchi
Arai Michio
Codama Mitsufumi
Kobori Isamu
Sakamoto Naoya
Sugiura Kazushi
Semiconductor Energy Laboratory Co,. Ltd.
TKD Corporation
Whitehead Carl W.
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