Thin film transistor array substrate having improved...

Liquid crystal cells – elements and systems – Particular excitation of liquid crystal – Electrical excitation of liquid crystal

Reexamination Certificate

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C349S042000, C349S187000, C349S138000, C349S139000, C349S158000, C257S043000, C257SE29296, C257SE21411, C438S030000, C438S104000

Reexamination Certificate

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07956947

ABSTRACT:
A thin film transistor array substrate, which can have high mobility of charge and can achieve uniform electrical characteristics for wide display devices, and a method of manufacturing the thin film transistor array substrate, are provided. The thin film transistor array substrate includes an oxide semiconductor layer having a channel and formed on an insulating substrate, a gate electrode overlapping the oxide semiconductor layer, a gate insulating film disposed between the oxide semiconductor layer and the gate electrode, and a passivation film formed on the oxide semiconductor layer and the gate electrode. At least one of the gate insulating film and the passivation film contains fluorine-containing silicon.

REFERENCES:
patent: 6969889 (2005-11-01), Cho et al.
patent: 7396695 (2008-07-01), Cho et al.
patent: 2004/0232443 (2004-11-01), Cho et al.
patent: 2009/0184315 (2009-07-01), Lee et al.

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