Thin film transistor array panel and methods for...

Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Field effect device in non-single crystal – or...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S149000

Reexamination Certificate

active

07943939

ABSTRACT:
Disclosed is a simplified method for manufacturing a liquid crystal display. A gate wire including a gate line, a gate pad, and a gate electrode are formed on a substrate. A gate insulating layer, a semiconductor layer, and an ohmic contact layer are sequentially deposited, and a photoresist layer is coated thereon. The photoresist layer is exposed to light through a mask and developed to form a photoresist pattern. At this time, a first portion of the photoresist pattern which is located between the source electrode and the drain electrode is thinner than a second portion which is located on the data wire, and the photoresist layer is totally removed on other parts. The thin portion is made by controlling the amount of irradiating light or by a reflow process to form a thin portion, and the amount of light is controlled by using a mask that has a slit, a small pattern smaller than the resolution of the exposure device, or a partially transparent layer. Next, the exposed portions of conductor layer are removed by wet etch or dry etch, and thereby the underlying ohmic contact layer is exposed. Then the exposed ohmic contact layer and the underlying semiconductor layer are removed by dry etching along with the first portion of the photoresist layer. The residue of the photoresist layer is removed by ashing. Source/drain electrodes are separated by removing the portion of the conductor layer at the channel and the underlying ohmic contact layer pattern. Then, the second portion of the photoresist layer is removed, and red, green, and blue color filters, a pixel electrode, a redundant gate pad, and a redundant data pad are formed.

REFERENCES:
patent: 5349503 (1994-09-01), Blonder et al.
patent: 5870157 (1999-02-01), Shimada et al.
patent: 6022753 (2000-02-01), Park et al.
patent: 6104462 (2000-08-01), Kurorati et al.
patent: 6124917 (2000-09-01), Fujioka et al.
patent: 6130443 (2000-10-01), Hong et al.
patent: 6137551 (2000-10-01), Jeong
patent: 6255706 (2001-07-01), Watanabe et al.
patent: 6300152 (2001-10-01), Kim
patent: 6310672 (2001-10-01), Koike et al.
patent: 6380559 (2002-04-01), Park et al.
patent: 6531392 (2003-03-01), Song et al.
patent: 6577374 (2003-06-01), Nakata et al.
patent: 6674495 (2004-01-01), Hong et al.
patent: 6759281 (2004-07-01), Kim et al.
patent: 7393726 (2008-07-01), Kim et al.
patent: 7759176 (2010-07-01), Kim et al.
patent: 08-339974 (1996-12-01), None
patent: 09-045930 (1997-02-01), None
patent: 09-90415 (1997-04-01), None
patent: 09-293878 (1997-11-01), None
patent: 10-163174 (1998-06-01), None
patent: 11-064885 (1999-03-01), None
patent: 11-153809 (1999-06-01), None
patent: 2000-164886 (2000-06-01), None
patent: 2000-305113 (2000-11-01), None
patent: 2000-66240 (2002-03-01), None
patent: 96-0018698 (1996-06-01), None
patent: 98-0003704 (1998-03-01), None
Monthly FPD Intelligence “Devising a process for manufacturing Mikuni Denshi IPS TFT-LCD through 2 PEP Exposing the channel portion of TFT to half-tone exposure”, May 1999, pp. 31-35.
European Search Report corresponding to EP09008028.4, Aug. 3, 2010, 9 pages.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Thin film transistor array panel and methods for... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Thin film transistor array panel and methods for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thin film transistor array panel and methods for... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2622961

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.