Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Responsive to electromagnetic radiation
Reexamination Certificate
2011-07-12
2011-07-12
Richards, N Drew (Department: 2895)
Semiconductor device manufacturing: process
Making device or circuit responsive to nonelectrical signal
Responsive to electromagnetic radiation
C438S149000, C438S151000, C438S158000, C438S166000, C257S040000, C257S053000, C257S059000, C257S067000, C257S079000, C257SE21414
Reexamination Certificate
active
07977144
ABSTRACT:
A method for a thin film transistor array panel includes forming a gate line and a pixel electrode on a substrate, forming a gate insulating layer covering the gate line, forming a data line including a source electrode and a drain electrode on the gate insulating layer, forming an interlayer insulating layer covering the data line and the drain electrode on the gate insulating layer, forming a first opening in the interlayer insulating layer, forming an organic semiconductor in the first opening, forming a passivation layer on the organic semiconductor and the interlayer insulating layer, and forming a second opening in the interlayer insulating layer to expose the pixel electrode.
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Cho Seung-Hwan
Choi Tae-Young
Kim Bo-sung
Noh Jung-Hun
Song Keun-kyu
Innovation Counsel LLP
Lee Kyoung
Richards N Drew
Samsung Electronics Co,. Ltd.
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