Thin film transistor and method of manufacturing the same

Liquid crystal cells – elements and systems – Particular excitation of liquid crystal – Electrical excitation of liquid crystal

Reexamination Certificate

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C257S059000, C257SE29003, C257SE21143

Reexamination Certificate

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07864257

ABSTRACT:
A thin film transistor and a method of manufacturing the thin film transistor is disclosed. The thin film transistor includes first and second ohmic contact layers, an activation layer, an insulating layer, a source electrode formed on the insulating layer and connected to the first ohmic contact layer through first contact hole, a drain electrode formed on the insulating layer and connected to the second ohmic contact layer through second contact hole, a gate electrode formed on the insulating layer between the source electrode and the drain electrode and overlapping the activation layer, and a protective layer formed on the source electrode, the drain electrode, and the gate electrode.

REFERENCES:
patent: 5061648 (1991-10-01), Aoki et al.
patent: 5097297 (1992-03-01), Nakazawa
patent: 5191453 (1993-03-01), Okumura
patent: 6692899 (2004-02-01), Lai
patent: 2004/0263948 (2004-12-01), Lee et al.
patent: 2006/0202204 (2006-09-01), Choi et al.
patent: 2001-215530 (2001-08-01), None
patent: 2006-058676 (2006-03-01), None
patent: 1020050056217 (2005-06-01), None

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