Thin film transistor and method of fabricating thin film...

Active solid-state devices (e.g. – transistors – solid-state diode – Responsive to non-electrical signal – Electromagnetic or particle radiation

Reexamination Certificate

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C257SE29278

Reexamination Certificate

active

07667287

ABSTRACT:
Provided are a thin film transistor (TFT) capable of increasing ON current and decreasing OFF current values, a TFT substrate having the polysilicon TFT, a method of fabricating the polysilicon TFT, and a method of fabricating a TFT substrate having the polysilicon TFT. The polysilicon TFT substrate includes a gate line and a data line defining a pixel region, a pixel electrode formed in the pixel region, and a TFT including a gate electrode connected to the gate line, a source electrode connected to the data line, a drain electrode connected to the pixel electrode, and a polysilicon active layer forming a channel between the source and drain electrodes. The polysilicon active layer includes a channel region on which the gate electrode is superposed, source and drain regions connected to the source and drain electrode, respectively, and at least two lightly doped drain (LDD) regions y formed between the source region and the channel region and between the drain region and the channel region. The LDD regions have an impurity concentration different from each other.

REFERENCES:
patent: 6773996 (2004-08-01), Suzawa et al.
patent: 6828950 (2004-12-01), Koyama
patent: 2002/0145141 (2002-10-01), Chen
patent: 2003/0132523 (2003-07-01), Ohtani et al.
patent: 2005/0051773 (2005-03-01), Nakajima

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