Thin-film shape memory alloy device and method

Details Thin-film shape memory alloy device and method Thin-film shape memory alloy device and method

2011-07-19

2011-07-19

McDonald, Rodney G (Department: 1724)

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

C204S192120, C216S041000, C216S096000, C216S100000

Reexamination Certificate

active

07981258

ABSTRACT:
A thin film device, such as an intravascular stent, is disclosed. The device is formed of a seamless expanse of thin-film (i) formed of a sputtered nitinol shape memory alloy, defining, in an austenitic state, an open, interior volume, having a thickness between 0 5-50 microns, having an austenite finish temperature Afbelow 37° C.; and demonstrating a stress/strain recovery greater than 3% at 37° C. The expanse can be deformed into a substantially compacted configuration in a martensitic state, and assumes, in its austenitic state, a shape defining such open, interior volume. Also disclosed is a sputtering method for forming the device.

REFERENCES:
patent: 6013854 (2000-01-01), Moriuchi
patent: 6169269 (2001-01-01), Maynard
patent: 6379383 (2002-04-01), Palmaz et al.
patent: 6533905 (2003-03-01), Johnson et al.
patent: WO 99/62432 (1999-12-01), None
Yang et al. “Transformations in sputter-deposited thin films of NiTi shape memory alloy” Materials Letters 22 (Feb. 1995) pp. 137-140.

Affiliated with

Also associated with

Rating

Thin-film shape memory alloy device and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Thin-film shape memory alloy device and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thin-film shape memory alloy device and method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2727950