Thin film producing method

Details Thin film producing method Thin film producing method

2011-05-31

2011-05-31

Nguyen, Nam X (Department: 1724)

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

C204S298150, C204S298120

Reexamination Certificate

active

07951272

ABSTRACT:
The present invention is made to provide a method of producing a ZnO thin film in which the c-axis is oriented in-plane over a large area. A ZnO target28as the material of the thin film is sputtered by using a magnetron sputtering system, and a flow of material (material flow) directed from the cathode23to the anode24is generated in a plasma. The material flow has a high density at its central part and has a low density as it departs from the central part. A substrate20is fixed at a position displaced from the central axis of a region30where the material flow is generated so as to be inclined relative to the central axis. Thereby, a temperature gradient is naturally formed on the substrate20, and the c-axis of the ZnO thin film deposited on the substrate20is oriented in-plane to the temperature gradient direction. Since the substrate20is fixed so as to be inclined relative to the material flow, the area where the c-axis is consistently oriented in-plane becomes larger than before.

REFERENCES:
patent: 5382345 (1995-01-01), Huang et al.
patent: 6077402 (2000-06-01), Hong et al.
patent: 6106689 (2000-08-01), Matsuyama
patent: 6426786 (2002-07-01), Lu et al.
patent: B1 50-23918 (1975-08-01), None
patent: 06088218 (1994-03-01), None
patent: A 8-078333 (1996-03-01), None
patent: A 8-228398 (1996-09-01), None
patent: A 2004-156057 (2004-06-01), None
patent: A 2004-244716 (2004-09-01), None
patent: B1 3561745 (2004-09-01), None
MAchine Translation of JP06088218A to Ogawa. Published Mar. 29, 1994.
N. Yokokawa et al., “Love-type Surface-Acoustic Waves Propagating in Amorphous iron-boron Films with Multilayer Structure” J. Appl. Phys. vol. 72, No. 2, Jul. 1992, pp. 360-366.
T. Yanagitani et al., “Charaterization of (1120) Textured ZnO Films Fabricated by RF Magnetron Sputtering”, Japanese Journal of Applied Physics, vol. 43, No. 5B, 2004, 3004-3007.

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