Thin film processing method and thin processing apparatus

Details Thin film processing method and thin processing apparatus Thin film processing method and thin processing apparatus

2006-04-10

2008-07-08

Lee, Hsien-ming (Department: 2823)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

On insulating substrate or layer

C438S487000, C257S074000, C257S075000, C257SE21001, C117S008000, C117S010000, C369S240000, C369S244100

Reexamination Certificate

active

07396712

ABSTRACT:
A thin film processing method for processing the thin film by irradiating an optical beam to the thin film. A unit of the irradiation of the optical beam includes a first and a second optical pulse irradiation to the thin film, and the unit of the irradiation is carried out repeatedly to process the thin film. The first and the second optical pulse have pulse waveforms different from each other. Preferably, a unit of the irradiation of the optical beam includes the a first optical pulse irradiated to the thin film and a second optical pulse irradiated to the thin film starting substantially simultaneous with the first optical pulse irradiation. In this case, the relationship between the first and the second optical pulse satisfies (the pulse width of the first optical pulse)<(the optical pulse of the second optical pulse) and (the irradiation intensity of the first optical pulse)≧(the irradiation intensity of the second optical pulse). A silicon thin film with a small trap state density can be formed by the optical irradiation.

REFERENCES:
patent: 5533040 (1996-07-01), Zhang
patent: H08-148423 (1996-06-01), None
patent: 09-293872 (1997-11-01), None
patent: H10-289876 (1998-10-01), None
patent: H09-063974 (1999-03-01), None
patent: H11-307450 (1999-11-01), None
patent: 2000-021776 (2000-01-01), None

Affiliated with

Also associated with

Rating

Thin film processing method and thin processing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Thin film processing method and thin processing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thin film processing method and thin processing apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3963456