Thin film processing method and system

Details Thin film processing method and system Thin film processing method and system

2007-03-27

2007-03-27

Baumeister, B. William (Department: 2891)

Semiconductor device manufacturing: process

With measuring or testing

Optical characteristic sensed

C438S782000, C438S788000, C257SE21242, C250S492230, C250S492300

Reexamination Certificate

active

10745520

ABSTRACT:
In a thin film processing method and system, a film thickness is regulated by using electron beams irradiated from a plurality of electron beam tubes onto a film of varying thickness formed on an object to be processed, wherein the output powers or beam irradiation times of the electron beam tubes are individually controlled according to a distribution of the thickness. In the method and system, electric charges charged in a film of an object to be processed can be removed also.

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