Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1978-11-21
1980-01-01
Smith, John D.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430329, 1566591, 204192D, 427 84, 427 88, 427 89, 427 93, 427 94, 427 95, 427 96, 427 99, 427125, 427126, 427259, 427 75, B05D 512, H01L 2948, H01L 3118
Patent
active
041817559
ABSTRACT:
A method of pattern generating a circuit film and adjacent barrier film on a substrate. A continuous layer of circuit film is applied to the substrate surface, and a photoresist pattern is delineated on the circuit film such that the photoresist remains on the circuit film pattern area. The area of circuit film not covered by photoresist is then removed, exposing the substrate surface. While retaining the photoresist which covers the circuit film pattern, the entire substrate surface is coated with the barrier film. The remaining photoresist is then removed, causing the barrier film which covers it to lift off, thereby exposing the circuit film pattern.
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Fredericks et al., "Polysulfone Lift-Off Masking Technique" IBM Tech. Dis. Bulletin, vol. 20, No. 3, 1977.
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Duigon Ferdinand C.
Liu Shing-Gong
Christoffersen Harold
Cohen Donald S.
Glick Kenneth R.
RCA Corporation
Smith John D.
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