Optics: measuring and testing – By polarized light examination – Of surface reflection
Reexamination Certificate
2005-07-26
2005-07-26
Smith, Zandra V. (Department: 2877)
Optics: measuring and testing
By polarized light examination
Of surface reflection
Reexamination Certificate
active
06922244
ABSTRACT:
An optical measurement system, including a reference ellipsometer and a non-contact optical measurement device, evaluates a sample having at least a partially known composition. The reference ellipsometer includes a light generator to generate a beam of quasi-monochromatic light of known wavelength and polarization, directed at a non-normal angle of incidence to interact with the sample. An analyzer creates interference between S and P polarized components of the reflected beam, the intensity of which is measured by a detector. A processor determines the polarization state using the detected intensity, and determines an optical property of the sample based upon the determined polarization state, the known wavelength, and the composition. The processor calibrates the optical measurement device, used to measure an optical parameter of the sample, by comparing the measured optical parameter from the optical measurement device to the determined optical property from the reference ellipsometer.
REFERENCES:
patent: 3824017 (1974-07-01), Galyon
patent: 3926524 (1975-12-01), Margulies et al.
patent: 3985447 (1976-10-01), Aspnes
patent: 4053232 (1977-10-01), Dill et al.
patent: 4155009 (1979-05-01), Lieber et al.
patent: 4298283 (1981-11-01), Makosch et al.
patent: 4309103 (1982-01-01), Bodlaj
patent: 4332476 (1982-06-01), Stenberg et al.
patent: 4492466 (1985-01-01), Aspnes
patent: 4523848 (1985-06-01), Gorman et al.
patent: 4606641 (1986-08-01), Yamada et al.
patent: 4647207 (1987-03-01), Björk et al.
patent: 4672196 (1987-06-01), Canino
patent: 4681444 (1987-07-01), Ferber et al.
patent: 4796995 (1989-01-01), Salzman et al.
patent: 4872758 (1989-10-01), Miyazaki et al.
patent: 4899055 (1990-02-01), Adams
patent: 4905170 (1990-02-01), Forouhi et al.
patent: 4929078 (1990-05-01), Harmon
patent: 4931132 (1990-06-01), Aspnes et al.
patent: 4969740 (1990-11-01), Sonobe
patent: 4999014 (1991-03-01), Gold et al.
patent: 5018863 (1991-05-01), Vareille et al.
patent: 5042951 (1991-08-01), Gold et al.
patent: 5091320 (1992-02-01), Aspnes et al.
patent: 5101111 (1992-03-01), Kondo
patent: 5120966 (1992-06-01), Kondo
patent: 5131752 (1992-07-01), Yu et al.
patent: 5181080 (1993-01-01), Fanton et al.
patent: 5277747 (1994-01-01), Aspnes
patent: 5296913 (1994-03-01), Heffner
patent: 5298973 (1994-03-01), Fukazawa et al.
patent: 5317150 (1994-05-01), Norris et al.
patent: 5321970 (1994-06-01), Davies et al.
patent: 5329357 (1994-07-01), Bernoux et al.
patent: 5337150 (1994-08-01), Mumola
patent: 5365334 (1994-11-01), Bottka
patent: 5371586 (1994-12-01), Chau
patent: 5373359 (1994-12-01), Woollam et al.
patent: 5408322 (1995-04-01), Hsu et al.
patent: 5412473 (1995-05-01), Rosencwaig et al.
patent: 5416588 (1995-05-01), Ducharme et al.
patent: 5416594 (1995-05-01), Gross et al.
patent: 5420680 (1995-05-01), Isobe et al.
patent: 5444528 (1995-08-01), Puschell
patent: 5452091 (1995-09-01), Johnson
patent: 5485082 (1996-01-01), Wisspeintner et al.
patent: 5485271 (1996-01-01), Drevillon et al.
patent: 5489980 (1996-02-01), Anthony
patent: 5521705 (1996-05-01), Oldenbourg et al.
patent: 5521706 (1996-05-01), Green et al.
patent: 5526117 (1996-06-01), Wielsch et al.
patent: 5528649 (1996-06-01), Heidsieck
patent: 5568252 (1996-10-01), Kusuda et al.
patent: 5581350 (1996-12-01), Chen et al.
patent: 5581354 (1996-12-01), Hassbjer
patent: 5582646 (1996-12-01), Woollam et al.
patent: 5596406 (1997-01-01), Rosencwaig et al.
patent: 5596411 (1997-01-01), Fanton et al.
patent: 5608526 (1997-03-01), Piwonka-Corle et al.
patent: 5610392 (1997-03-01), Nagayama et al.
patent: 5612782 (1997-03-01), Keränen et al.
patent: 5615009 (1997-03-01), Sakura et al.
patent: 5625455 (1997-04-01), Nash et al.
patent: 5686993 (1997-11-01), Kokubo et al.
patent: 5739909 (1998-04-01), Blayo et al.
patent: 5754294 (1998-05-01), Jones et al.
patent: 5764365 (1998-06-01), Finarov
patent: 5771094 (1998-06-01), Carter et al.
patent: 5777733 (1998-07-01), Radziuk
patent: 5798837 (1998-08-01), Aspnes et al.
patent: 5835221 (1998-11-01), Lee et al.
patent: 5933792 (1999-08-01), Andersen et al.
patent: 5956145 (1999-09-01), Green et al.
patent: 6278519 (2001-08-01), Rosencwaig et al.
patent: 93 00 956.9 (1993-05-01), None
patent: 0 503 874 (1992-09-01), None
patent: 0 652 415 (1995-05-01), None
patent: 0 396 409 (1999-11-01), None
patent: 61-182507 (1986-08-01), None
patent: 1023126 (1989-01-01), None
patent: 5-71923 (1993-03-01), None
patent: 5-93611 (1993-04-01), None
patent: 5-133811 (1993-05-01), None
patent: 7-159131 (1995-06-01), None
patent: 8-210972 (1996-08-01), None
patent: 2608132 (1997-02-01), None
patent: WO 94/25823 (1994-11-01), None
patent: WO 96/12941 (1996-05-01), None
A. Ambirajan et al., “Optimum Angles For a Polarimeter: Part I,”Optical Engineering, vol. 34, No. 6, pp. 1651-1655, Jun. 1995.
A. Ambirajan et al., “Optimum Angles For A Polarimeter: Part II,”Optical Engineering, vol. 34, No. 6, pp. 1656-1658, Jun. 1995.
D.E. Aspnes et al., “High Precision Scanning Ellipsometer,”Applied Optics, vol. 14, pp. 220-228, Jan. 1975.
I. An et al., “Simultaneous Real Time Spectroscopic Ellipsometry and Reflectance for Monitoring Semiconductor and Thin Film Preparation,”Materials Research Society Symposium Proc., vol. 34, pp. 33-38, 1994.
I. Appenzeller, “A New Polarimeter for Faint Astronomical Objects,” Yerkes Observatory, Univ. of Chicago, pp. 136-139, Jan. 1967.
D.E. Aspnes, “Alignment of an Optically Active Biplate Compensator,”Applied Optics, vol. 10, pp. 2545-2546, Nov. 1971.
D.E. Aspnes et al., “Photomultiplier Linearization and System Stabilization for Photometric Ellipsometers and Polarimeters,”SPIE, vol. 112-Optical Polarimetry, pp. 62-66, 1977.
D.E. Aspnes et al., “Rotating-Compensator/Analyzer Fixed-Analyzer Ellipsometer: Analysis and Comparison to Other Automatic Ellipsometers,”J. Opt. Soc. Am., vol. 66, No. 9, Sep. 1976, pp. 949-954.
D.K. Burge et al., “Effect of a Thin Surface Film on the Ellipsometric Determination of Optical Constants,”Journal of the Optical Society of America, vol. 54, No. 12, pp. 1428-1433, Dec. 1964.
B.D. Cahan, “Implications of Three Parameter Solutions to the Three-Layer Model,”Surface Science, vol. 56, pp. 354-372, 1976.
D. Clarke et al., “Polarized Light and Optical Measurement,” Chapter 4 and bibliography, Pergamon Press Ltd., Oxford, pp. 118-154 and 179-182, 1971.
D. Clarke et al., “A Three-Channel Astronomical Photoelectric Spectropolarimeter,”Journal of Scientific Instruments(Journal of Physics E), Series 2, vol. 1, pp. 409-412, 1968.
W. Duncan et al., “Insitu Spectral Ellipsometry for Real-Time Measurement and Control,”Applied Surface Science, vol. 63, pp. 9-16, 1993.
Den Boer, J.H.W.G. et al., “Spectroscopic Rotating Compensator Ellipsometry in the Infrared: Retarder Design and Measurement,”Meas. Sci. Technol., vol. 8, Jan. 20, 1997, pp. 484-492.
T. Gehrels (ed.), “Planets, Stars and Nebulae Studied with Photopolarimetry,” University of Arizona Press, pp. 135-175, 1974.
A. Hamnett et al., “An Ellipsometric Study of Polypyrrole Films on Platinum,”J. Electroanal Chem., vol. 270, pp. 479-488, 1989.
P.S. Hauge, “Generalized Rotating-Compensator Ellipsometry,”Surface Science, vol. 56, pp. 148-160, 1976.
P.S. Hauge, “Recent Developments in Instrumentation in Ellipsometry,”Surface Science, vol. 96, pp. 108-140, 1980.
P.S. Hauge et al., “A Rotating Compensator Fourier Ellipsometer,”Engineering Technology, 5 pages in length, Mar. 1975.
E.B. Hodgdon, “Theory, Design, and Calibration of a UV Spectrophotopolarimeter,”Applied Optics, vol. 4, No. 11, pp. 1479-1483, Nov. 1965.
Y.T. Kim et al., “Fast Scanning Spectroelectrochemical Ellipsometry: In-Situ Characterization of Gold Oxide,”Surface Science, vol. 233, pp. 341-350, 1990.
H.V. Nguyen et al.,.“Evolution of the Optical Functions of Thin-F
Opsal Jon
Rosencwaig Allan
Smith Zandra V.
Stallman & Pollock LLP
Therma-Wave, Inc.
LandOfFree
Thin film optical measurement system and method with... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Thin film optical measurement system and method with..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thin film optical measurement system and method with... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3421389