Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1984-10-05
1986-11-18
Sheehan, John P.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
2041923, 427 48, 427132, 427250, 427294, C23C 1400
Patent
active
046234390
ABSTRACT:
A magnetic thin film of Ni-Co-Fe ternary alloy containing at most 75% by weight of Ni, 10 to 90% by weight of Co, and at most 15% by weight of Fe, which shows the magnetostriction constant between +2.times.10.sup.-6 to -2.times.10.sup.-6 and shows a uniaxial magnetic anisotropy of at most 10 Oe.
The film is formed through the vacuum evaporation of the alloy during which two orthogonal external magnetic fields, directions x and y, are alternately applied over the deposition surface of a substrate.
The film is suitable for a core material of a thin film magnetic head with a higher recording density.
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Hanazono Masanobu
Hara Shin-ichi
Kumagai Akira
Mitsuoka Katsuya
Narishige Shinji
Hitachi , Ltd.
Sheehan John P.
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