Thin film magnetic head and method of manufacturing the same

Details Thin film magnetic head and method of manufacturing the same Thin film magnetic head and method of manufacturing the same

1993-05-05

1994-05-31

Powell, William

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156655, 156656, 1566591, 1566611, 156667, 29603, 252 791, B44C 122, C23F 100

Patent

active

053166175

ABSTRACT:
A thin film magnetic head comprising a substrate on which are successively formed a base layer, a lower magnetic film, a gap layer, an insulator layer, a conductor coil, an upper magnetic film, and a first mask, is manufactured by a method in which one or more of a gas which can be expressed by the general formula of CnHxFy (where n.gtoreq.1, x+y=2n+2, x>0, y>0, and x.gtoreq.y); and a gas which can be expressed by the general formula of CnHxFy (where n.gtoreq.1, x+y=2n+2, x.gtoreq.0, y.gtoreq.0, and x<y) is used. The structure of the magnetic head thus obtained is such that, at a height near the interface between the mask and the upper magnetic film provided therebelow, the angle defined by the side edge surfaces of the mask and the above-mentioned interface ranges from 75.degree. to 90.degree..

REFERENCES:
patent: 4592801 (1986-06-01), Hara et al.
patent: 4791719 (1988-12-01), Kobayashi et al.
patent: 4971896 (1990-11-01), Kawabe et al.
patent: 4992901 (1991-02-01), Keel et al.

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