Coating apparatus – Gas or vapor deposition – Crucible or evaporator structure
Patent
1996-08-07
2000-08-29
Bueker, Richard
Coating apparatus
Gas or vapor deposition
Crucible or evaporator structure
427596, C23C 1400
Patent
active
061102911
ABSTRACT:
A thin film forming apparatus using laser includes a chamber (1), a target (5) placed therein, a laser light source (10) for emitting laser beam to target (5), and a substrate holder (3). When target (5) is irradiated with laser beam (16), a plume (15) is generated, and materials included in plume (15) are deposited on the surface of a substrate (2) held by substrate holder (3). The laser beam emitted from laser light source (10) has its cross section shaped to a desired shape when passed through a shielding plate (4804), for example, so that the surface of the target (5) is irradiated with the beam having uniform light intensity distribution. Therefore, a plume (15) having uniform density distribution of active particles is generated, and therefore a thin film of high quality can be formed over a wide area with uniform film quality, without damaging the substrate.
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Fujino Naohiko
Furukawa Akihiko
Furukawa Taisuke
Haruta Kenyu
Horikawa Tsuyoshi
Bueker Richard
Mitsubishi Denki & Kabushiki Kaisha
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