Drying and gas or vapor contact with solids – Process – Gas or vapor pressure is subatmospheric
Reexamination Certificate
2005-08-09
2005-08-09
Gravini, Stephen (Department: 3749)
Drying and gas or vapor contact with solids
Process
Gas or vapor pressure is subatmospheric
Reexamination Certificate
active
06925731
ABSTRACT:
A cleaning process for cleaning a thermal processing apparatus includes: a heating step of heating an interior of a reaction tube at 300° C., and a cleaning step of removing deposits deposited in the thermal processing apparatus. In the cleaning step, a cleaning gas containing fluorine gas, chlorine gas and nitrogen gas is supplied into the interior of the reaction tube heated at 300° C. to remove silicon nitride so to clean an interior of the thermal processing apparatus.
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Notification of Reason for Rejection, mailed Dec. 24, 2002.
Translation of Notification of Reason for Rejection, mailed Dec. 24, 2002.
International Preliminary Examination Report (PCT/IPEA/409) (translated) issued for PCT/JP2002/001492.
Notification of Transmittal of Copies of Translation of the International Preliminary Examination Report (PCT/IB/338) issued for PCT/JP2002/001492.
Nishimura Kazuaki
Spaull Phillip
Tago Kenji
Tojo Yukio
Gravini Stephen
Smith , Gambrell & Russell, LLP
Tokyo Electron Limited
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