Thin film forming apparatus

Details Thin film forming apparatus Thin film forming apparatus

1990-07-24

1991-10-22

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118715, 118725, C23C 836, C23C 1432, C23C 1648, C23C 1650

Patent

active

050585274

ABSTRACT:
A thin film forming apparatus for forming a thin film on a substrate with a vaporized source material being supplied from an external material supplying unit. The thin film forming apparatus comprises a vacuum chamber for providing a vacuum pressure at which the vaporized source material is deposited on the substrate, a material supplying part for supplying particles constituting the vaporized source material to the vacuum chamber, an electrode for holding the substrate, a grid for allowing the particles to travel from the material supplying part to the electrode through the grid, a filament for generating thermions to ionize the particles, a power supply for applying a voltage to the grid so that the grid has a positive potential when measured with respect to the electrode and with respect to the filament, a plurality of openings being formed on the material supplying part for directing the emitted particles from the plurality of openings toward the substrate, and an emission uniforming material for uniforming the quantity of the emitted particles.

REFERENCES:
patent: 4774416 (1988-09-01), Askary
patent: 4974544 (1990-12-01), Ohta

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