Thin film-forming apparatus

Details Thin film-forming apparatus Thin film-forming apparatus

2005-11-01

2005-11-01

Lund, Jeffrie R. (Department: 1763)

Coating apparatus

Gas or vapor deposition

C156S345330

Reexamination Certificate

active

06960262

ABSTRACT:
A thin film formation apparatus by which source gas is supplied uniformly to the surface of a substrate so that an organic thin film of a uniform film thickness can be formed on the surface of the substrate. The thin film formation apparatus includes a vacuum chamber (11), a substrate holder (12) provided in the vacuum chamber (11), and a gas supplying end element (22) for supplying gas toward a substrate mounting face (12a) of the substrate holder (12). The gas supplying end element (22) is formed so as to supply the source gas in an elongated rectangular shape to the substrate mounting face (12a).

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