Thin film forming apparatus

Details Thin film forming apparatus Thin film forming apparatus

1998-12-14

2000-07-18

Dang, Thi

Coating apparatus

Gas or vapor deposition

With treating means

118723MW, 118728, 156345, 20429816, 20429836, C23C 1600, C23F 102

Patent

active

060891858

ABSTRACT:
A thin film forming apparatus is formed of a vacuum chamber, a base plate holder for holding a base plate near a central part of the vacuum chamber, and ECR plasma generating devices respectively connected to both side portions of the vacuum chamber. A magnetic field generating device is situated adjacent to the vacuum chamber for generating a predetermined magnetic field in the vacuum chamber, and a gas introducing system is connected to the vacuum chamber for introducing a reaction gas into the vacuum chamber. Since the base plate holder has a shape corresponding to an external shape of the base plate, a distance between the base plate and the base plate holder is uniform. The films with uniform thicknesses can be formed on both surfaces of the base plate.

REFERENCES:
patent: 5458687 (1995-10-01), Shichida et al.
patent: 5685913 (1997-11-01), Hirose et al.
patent: 5792272 (1998-08-01), Van Os et al.
patent: 5961773 (1999-10-01), Ichimura et al.
patent: 5983829 (1999-11-01), Suzuki
patent: 6033478 (2000-03-01), Kholodenko

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