Thin film ferroelectric flat panel display devices, and methods

Details Thin film ferroelectric flat panel display devices, and methods Thin film ferroelectric flat panel display devices, and methods

1994-04-15

1995-09-26

Pascal, Robert J.

Electric lamp and discharge devices: systems

Cathode ray tube circuits

3151693, 313497, 313500, 313503, 313505, H01J 2334

Patent

active

054536618

ABSTRACT:
A flat panel display includes a ferroelectric thin film between first and second spaced apart electrodes. The ferroelectric thin film emits electrons upon application of a predetermined voltage between the first and second spaced apart electrodes. The electrons are emitted in an electron emission path and impinge upon a luminescent layer such as a phosphor layer, which produces luminescence upon impingement upon the emitter electrodes. The ferroelectric thin film is preferably about 2 .mu.m or less in thickness and is preferably a polycrystalline ferroelectric thin film. More preferably, the thin ferroelectric film is a highly oriented, polycrystalline thin ferroelectric film. Most preferably, highly oriented ferroelectric thin film has a preferred (001) crystal orientation and is about 2 .mu.m or less in thickness. A flat panel display may be formed of arrays of such display elements. Top and bottom electrodes or side electrodes may be used. The display may be formed using conventional microelectronic fabrication steps.

REFERENCES:
patent: 4577133 (1986-03-01), Wilson
patent: 4850677 (1989-07-01), Okumura
patent: 5131065 (1992-07-01), Briggs et al.
patent: 5164799 (1992-11-01), Uno
patent: 5170092 (1992-12-01), Tomii et al.
patent: 5216324 (1993-06-01), Curtin
patent: 5317236 (1994-05-01), Zavracky et al.
patent: 5384517 (1995-01-01), Uno
Electroluminescent Displays, L. E. Tannas, Jr., Chapter 8 of Flat-Panel Displays and CRTs, edited by L. E. Tannas, Jr., Van Nostrand Reinhold Publisher, New York, 1985, pp. 237-284.
Time-Dependent Electron Emission from Ferroelectrics by External Pulsed Electric Fields, H. Gundel et al., J. Appl. Phys. 69(2), 15 Jan., 1991, pp. 975-982.
Pulsed Emission Characteristics of Ferroelectrics Cathode Under Two Exciting Modes, Z. En-guan et al., preprint (1993).
Electron-Beam Diodes Using Ferroelectric Cathodes, J. D. Ivers, J. Appl. Phys. 73(6), 15 Mar., 1993, pp. 2667-2671.
Electron Emission From Ferroelectric Materials, G. Rosenman et al., J. Appl. Phys. 73(4), 15 Feb., 1993, pp. 1904-1908.
Field-Excited Electron Emission from Ferroelectric Ceramic in Vacuum, J. Asano et al., Japanese Journal of Applied Physics, vol. 31, Part 1, 1992, pp. 3098-3101.
Electron Emission into Vacuum from lead-Zirconate-Titanate Ferroelectric Ceramics Induced by Polarization Reversal, J. Asano et al., Jpn. J. Appl. Phys., vol. 32 (1993), PT. 1, No. 113, pp. 396-398.
Field-Excited Electron Emission from Lanthanum-Doped, Barium-Strontium-Titanate Ceramics, J. Handerek et al., Ferroelectrics, 1992, vol. 128, pp. 43-48.
Ferroelectric Cathode Measurements, S. E. Sampayan et al., preprint (1993).
Initial Studies of Ferroelectric Cathodes, T. Cavazos et al., preprint (1993).
Electron Emission by Nanosecond Switching in PLZT, H. Gundel, Proceedings of the Third International Symposium on Integrated Ferroelectrics, University of Colorado Press, Colorado Springs, 1991, pp. 501-514.
A Review of Composition-Structure-Property Relationships for PZT-Based Heterostructure Capacitors, O. Auciello et al., Integrated Ferroelectronics, preprint, 1994.
Physical Vapor Deposition of Multicomponent Dioxide Thin Films: Techniques, Basic Deposition Processes and Film Processing-Microstructure-Property Relationships, O. Auciello et al., Multicomponent and Multilayer Thin Films for Advanced Microtechnologies: Techniques, Fundamentals and Devices, Kluwer Academic Publishers, 1993, pp. 151-208.
Fatigue and Retention of Pb(Zr.sub.0.53 Ti0.47)O.sub.3 Thin Film Capacitors With Pt and RuO.sub.2 Electrodes, Shareef et al., Integrated Ferroelectronics, preprint, 1994.

Affiliated with

Also associated with

Rating

Thin film ferroelectric flat panel display devices, and methods does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Thin film ferroelectric flat panel display devices, and methods , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thin film ferroelectric flat panel display devices, and methods will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1553748