Thin film detection method and apparatus

Details Thin film detection method and apparatus Thin film detection method and apparatus

1997-03-11

1999-08-10

Westin, Edward P.

Radiant energy

Photocells; circuits and apparatus

With circuit for evaluating a web, strand, strip, or sheet

25055902, 356355, G01B 902

Patent

active

059362545

ABSTRACT:
A method and apparatus for detecting the presence of a thin film such as a photoresist film on a semiconductor wafer or other substrate. Only when a film is present does the surface reflectance (reflective power) of light incident on the wafer surface vary sinusoidally when the incidence angle of the light is varied. This sinusoidal variation in the reflected optical power is due to interference occurring between the film surface and wafer surface reflections. This method and apparatus allows determining whether an undeveloped photoresist layer is present on a wafer; this is not possible using merely visual inspection especially when an underlying pattern is present. The present method and apparatus may also be used to determine the thickness of a particular thin film.

REFERENCES:
patent: 5232547 (1993-08-01), Drowley et al.
patent: 5293214 (1994-03-01), Ledger
patent: 5337150 (1994-08-01), Mumola
patent: 5381234 (1995-01-01), Barbee et al.
patent: 5729343 (1998-03-01), Aiyer
D. Willenborg et al., "A novel micro-spot dielectric film thickness measurement system", SPIE vol. 1594, Process Module Metrology, Control and Clustering (1991) pp. 322-333.

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