Thin film deposition chamber

Details Thin film deposition chamber Thin film deposition chamber

1999-09-22

2000-07-04

Lund, Jeffrie R

Coating apparatus

Gas or vapor deposition

With treating means

20429827, 118723VE, C23C 16448, C23C 1600

Patent

active

060822961

ABSTRACT:
A thin film deposition chamber utilizes a planetary fixture and two vapor sources to generate two partially overlapping vapor streams. The two vapor streams create a combined distribution profile. The planetary fixture holds a plurality of substrates in a position similar to a portion of the combined distribution profile.

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patent: 5478398 (1995-12-01), Nakanishi et al.
patent: 5741404 (1998-04-01), Cathey

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