Thin-film deposition apparatus using cathodic arc discharge

Details Thin-film deposition apparatus using cathodic arc discharge Thin-film deposition apparatus using cathodic arc discharge

1997-11-26

2000-02-22

Yee, Deborah

Coating apparatus

Gas or vapor deposition

With treating means

118723VE, 20429841, C23C 2200

Patent

active

060267631

ABSTRACT:
A thin-film deposition apparatus includes an arc vaporization portion from which charged particles of a deposition material are generated by a cathodic arc discharge, a plasma duct having a bend and guiding the charged particles from the arc vaporization portion to a substrate, a magnetic field generator for generating magnetic fields to direct the charged particles from the arc vaporization portion to the substrate, and a reflective magnetic field source installed in a convex portion of the bend of the plasma duct, for generating magnetic fields that interfere with the magnetic fields formed by the magnetic field generator so that magnetic flux lines are distributed along the plasma duct.

REFERENCES:
patent: 5476691 (1995-12-01), Komvopoulos et al.
patent: 5480527 (1996-01-01), Welty

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