Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1991-01-29
1992-10-13
Weisstuch, Aaron
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
136256, 118712, 118719, 118730, 20419226, 20429803, 20429826, 427 8, 4271263, 4271264, 437 2, C23C 1454, H01L 3118
Patent
active
051548100
ABSTRACT:
A system and process for forming optical quality, protective, relatively thick, thin film coatings on workpieces such as detectors or solar cells. The apparatus includes a rotary cylindrical sputtering system which incorporates separate deposition devices and at least one chemical reaction device for simultaneously (1) depositing materials which form tensile and compressive oxides and (2) oxidizing the deposited materials. The system also includes a stressometer system, preferably a cantilevered beam stressometer system which monitors the stress of the depositing film in-situ. The monitored stress levels are used to control the relative amounts of compressive and tensile materials which are deposited and, thus, control stress in the thin film coatings. In a preferred embodiment for forming protective covers on solar cells, the deposition devices are linear magnetron sputter cathode devices having silicon and aluminum targets, and the reaction device is a linear magnetron ion source oxidizer device. Film stress in the thin film coating is controlled by controlling power to the silicon and aluminum targets.
REFERENCES:
patent: 4320155 (1982-03-01), Gillery
patent: 4851095 (1989-07-01), Scobey et al.
C. D. Adams et al., Conference Record, 19th IEEE Photovoltaic Specialists Conf. (1987), pp. 469-474.
Beauchamp William T.
Kamerling Marc A.
Klinger Robert E.
Lehan John P.
Dalton Philip A.
Optical Coating Laboratory, Inc.
Weisstuch Aaron
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