Thermosensitive plate material for lithographic plate...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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Details

C430S138000, C430S271100, C430S302000

Reexamination Certificate

active

06911298

ABSTRACT:
A thermosensitive plate material for lithographic plate formation according to the present invention includes a substrate (1) and a thermosensitive layer (2) formed thereon. The thermosensitive layer (2) includes an organic polymer (4) containing lipophilic portion forming particles (3). In the thermosensitive layer (2), a surface portion (21) having a thickness of 0.1 μm or more does not contain the lipophilic portion forming particles (3) but contains a metal oxide (5). The surface portion (21) includes a hydrophilic organic polymer (41), which has been cured with the metal oxide (5). A portion (22) of the thermosensitive layer (2) on the substrate side contains the lipophilic portion forming particles (3). The organic polymer (42) constituting the base portion (22) need not be the hydrophilic organic polymer.

REFERENCES:
patent: 5569573 (1996-10-01), Takahashi et al.
patent: 6686125 (2004-02-01), Hoshi et al.
patent: 6821704 (2004-11-01), Ide et al.
patent: 2004/0081913 (2004-04-01), Mori
patent: 0 949 088 (1999-10-01), None
patent: 1 172 229 (2002-01-01), None
patent: 07-001849 (1995-01-01), None

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