Thermographic reversible photoresist

Details Thermographic reversible photoresist Thermographic reversible photoresist

1992-03-17

1993-06-01

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

525480, 525506, 528 25, 528 29, 522166, G03C 1492

Patent

active

052158616

ABSTRACT:
Reaction products of organosilane compounds and a novolac resin having phenolic groups are capable of generating either positive or negative tone patterns depending on the time and temperature of processing. Particular photosensitive materials contemplated have the following chemical formula: ##STR1##

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