Thermally stable, irradiation cross-linkable polymer systems bas

Details Thermally stable, irradiation cross-linkable polymer systems bas Thermally stable, irradiation cross-linkable polymer systems bas

1985-06-27

1988-04-05

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430311, 430312, 430324, 430325, 430280, 430287, 430286, 522100, G03C 500

Patent

active

047358912

ABSTRACT:
For shortening the exposure time of radiation-sensitive epoxy resin lacquers based on condensates of bisphenols and epichlorohydrin and for increasing their thermal stability, the number of reactive groups in each polymer repeating unit is increased by incorporating there into at least two hydroxyl groups and preferably five hydroxymethylene groups. When a composition of such a polyhydroxylated condensate is reacted with cinnamic acid chloride or the like, the resulting light sensitive condensate is utilizable as a coating in the manufacture of printed multilayer wirings. Intermediate tempering, drilling and additional protective films are eliminated. Such a condensate can also be employed in the field of integrated semiconductor circuits in VLSI technology where lacquer structures are produced.

REFERENCES:
patent: 3387976 (1968-06-01), Sorkin
patent: 3822235 (1974-07-01), Hunter et al.
patent: 3956043 (1976-05-01), Zahir et al.
Chem. Abstracts Citation, vol. 99, Issue 4, No. 23524G.
J. March "Advanced Organic Chemistry", 2nd edition, McGraw-Hill, 1977, p. 361.
Paul Karrer, "Organic Chemistry", p. 636, Third English edition 1947, Elsevier Publishing Co., Inc., New York.

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