Thermal treatment furnace in a system for manufacturing semicond

Details Thermal treatment furnace in a system for manufacturing semicond Thermal treatment furnace in a system for manufacturing semicond

1995-04-20

1997-05-27

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118715, 118733, 432241, 432242, C23C 1600

Patent

active

056328206

ABSTRACT:
A thermal treatment furnace for use with a semiconductor system is provided. The thermal treatment furnace includes a scavenger which sealingly encloses a lower end of a reaction tube so as to diminish gas leakage from the reaction tube.

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