Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate
2011-06-14
2011-06-14
Nguyen, Nam X (Department: 1724)
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
C204S298110, C204S298180
Reexamination Certificate
active
07959775
ABSTRACT:
A ceramic window in an iPVD module is provided with features that reduce heating of the window as a result of metal film deposits on the window. Dielectric dissipation and resistive heating of the metal film are reduced by the features. Reducing of the window heating is provided by either shaping the window surface on the chamber side of the window or providing structurally floating features to block at least a portion of a conductive path from forming on the chamber side window surface. The shaping can produce contours that prevent current paths from being created in the forming metal film. In addition or in the alternative, texture on the chamber side surface of the window is provided to increase surface area and thereby reduce film thickness.
REFERENCES:
patent: 5763851 (1998-06-01), Forster et al.
patent: 6132566 (2000-10-01), Hofmann et al.
patent: 6623595 (2003-09-01), Han et al.
patent: 6719886 (2004-04-01), Drewery et al.
patent: 6946054 (2005-09-01), Brcka
patent: 2003/0159782 (2003-08-01), Brcka
patent: 2005/0011453 (2005-01-01), Okumura et al.
patent: 2006/0137821 (2006-06-01), Howald et al.
Nasman Ronald
Vukovic Mirko
Brayton John
Nguyen Nam X
Tokyo Electron Limited
Wood Herron & Evans LLP
LandOfFree
Thermal stress-failure-resistant dielectric windows in... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Thermal stress-failure-resistant dielectric windows in..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thermal stress-failure-resistant dielectric windows in... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2744515