Etching a substrate: processes – Etching of semiconductor material to produce an article...
Patent
1996-10-17
1998-11-03
Breneman, R. Bruce
Etching a substrate: processes
Etching of semiconductor material to produce an article...
216 56, 438 54, H01L 21302
Patent
active
058303723
ABSTRACT:
Semiconductor component with monolithically integrated electronic circuits and monolithically integrated sensor/actuator, whereby the sensor/actuator is manufactured with methods of surface micromachining in a sensor layer (3) of polysilicon that is structured, for example, with sensor webs (6), and these sensor webs (6) are thermally insulated from a silicon substrate (1) by a cavity (4) that is produced in a sacrificial layer (2) and is closed gas-tight toward the outside with a closure layer (5).
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Alanko Anita
Breneman R. Bruce
Siemens Aktiengesellschaft
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