Thermal proximity effects in lithography

Details Thermal proximity effects in lithography Thermal proximity effects in lithography

2006-01-31

2006-01-31

Smith, Matthew (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C716S030000, C430S005000, C430S312000, C430S313000, C430S330000, C355S027000, C355S029000, C355S040000

Reexamination Certificate

active

06993742

ABSTRACT:
A proximity correction tool receives an indication of a feature in a lithographic design. The proximity correction tool predicts a film edge placement for the feature in a resist film based at least in part on thermal proximity effects in the resist film.

REFERENCES:
patent: 5304441 (1994-04-01), Samuels et al.
patent: 6040118 (2000-03-01), Capodieci
patent: 6818389 (2004-11-01), Fritze et al.
patent: 2002/0025375 (2002-02-01), Takamori et al.
patent: 2002/0076658 (2002-06-01), Matsushita et al.
patent: 2003/0008246 (2003-01-01), Cheng et al.

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