Thermal processing system with supplemental resistive heater and

Details Thermal processing system with supplemental resistive heater and Thermal processing system with supplemental resistive heater and

1995-05-26

1998-11-03

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

With treating means

118728, 118729, 118730, 118666, 118712, 118713, 118724, 432253, 219390, 219405, 219411, 392416, 392418, 374126, 374130, 374131, 374141, C23C 1600, G01J 500, F27B 514, F27D 1100

Patent

active

058302778

ABSTRACT:
System and method for determining thermal characteristics, such as temperature, temperature uniformity and emissivity, during thermal processing using shielded pyrometry. The surface of a semiconductor substrate is shielded to prevent interference from extrinsic light from radiant heating sources and to form an effective black-body cavity. An optical sensor is positioned to sense emitted light in the cavity for pyrometry. The effective emissivity of the cavity approaches unity independent of the semiconductor substrate material which simplifies temperature calculation. The shield may be used to prevent undesired backside deposition. Multiple sensors may be used to detect temperature differences across the substrate and in response heaters may be adjusted to enhance temperature uniformity.

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