Thermal processing apparatus and thermal processing method

Details Thermal processing apparatus and thermal processing method Thermal processing apparatus and thermal processing method

2008-06-03

2008-06-03

Fuqua, Shawntina (Department: 3742)

Electric heating

Heating devices

Combined with container, enclosure, or support for material...

C219S390000, C219S405000, C392S416000, C392S418000, C118S724000, C118S725000, C118S050100

Reexamination Certificate

active

07381928

ABSTRACT:
A light source including a plurality of flash lamps emits flashes thereby flash-heating a semiconductor wafer held by a thermal diffuser and a hot plate. The current distance of irradiation between the thermal diffuser and the hot plate holding the semiconductor wafer and the light source is so adjusted as to attain predetermined intensity of irradiation. The distance of irradiation between the thermal diffuser and the hot plate and the light source can be changed or corrected by vertically moving the thermal diffuser and the hot plate. The thermal processing apparatus which uses the flash lamps, is thus capable of readily controlling the intensity of irradiation.

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