Thermal processing apparatus

Seal for a joint or juncture – Seal between relatively movable parts – Relatively rotatable radially extending sealing face member

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

277 34, 277 72R, 277 79, 219390, 118733, F16J 1548

Patent

active

055337368

ABSTRACT:
Annular groove portions are formed in each of facing surfaces of a sealing portion of a processing vessel that is kept in an atmosphere of a prescribed gas or an atmosphere at a reduced pressure, and a thin annular plate is arranged in such a manner that it is sucked against the entire periphery of the opening portions of the annular groove portions. The annular groove portions are each connected to an exhaust device, and the facing surfaces of the sealing portion are sealed in a gas-tight manner by reducing the pressure in the annular groove portions so that the thin annular plate is sucked against the entire periphery of the openings of the annular groove portions. This configuration prevents the introduction of unwanted oxygen and moisture from the atmosphere into the interior of the processing vessel, and also provides a thermal processing apparatus which has a sealing portion that prevents the emission of gases and moisture at high temperatures.

REFERENCES:
patent: 2248385 (1941-07-01), Reynolds
patent: 2726882 (1955-12-01), Ryant, Jr.
patent: 2888879 (1959-06-01), Gaarder
patent: 3116932 (1964-01-01), Mallinckrodt
patent: 3144035 (1964-08-01), Hablanian et al.
patent: 3328039 (1967-06-01), McKeough
patent: 3699298 (1972-10-01), Briody
patent: 3817540 (1974-06-01), Nicholson
patent: 4146237 (1979-03-01), Bergman
patent: 4361335 (1982-11-01), Vinciguerra
patent: 4372565 (1983-02-01), Lien
patent: 4406458 (1983-09-01), Maier
patent: 4513978 (1985-04-01), Nicholson
patent: 4561662 (1985-12-01), Villepoix et al.
patent: 4565378 (1986-01-01), Wehrfritz et al.
patent: 4641603 (1987-02-01), Miyazaki et al.
patent: 4726689 (1988-02-01), Pollock
patent: 4735421 (1988-04-01), Neef et al.
patent: 4799692 (1989-01-01), Batzer et al.
patent: 4896890 (1990-01-01), Mauney
patent: 4950870 (1990-08-01), Mitsuhashi et al.
patent: 5133561 (1992-07-01), Hattori et al.
patent: 5230521 (1993-07-01), Ueta
patent: 5240263 (1993-08-01), Nicholson
patent: 5308955 (1994-05-01), Watanabe
patent: 5329095 (1994-07-01), Okase
patent: 5359148 (1994-10-01), Okase et al.
patent: 5368648 (1994-11-01), Sekizuka

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Thermal processing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Thermal processing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thermal processing apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1862397

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.