Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Configuration or pattern of bonds
Reexamination Certificate
2008-01-08
2008-01-08
Lam, Cathy F. (Department: 1775)
Active solid-state devices (e.g., transistors, solid-state diode
Combined with electrical contact or lead
Configuration or pattern of bonds
C257S779000, C257S788000, C257S791000, C257S793000
Reexamination Certificate
active
11368708
ABSTRACT:
An apparatus and system, as well as fabrication methods therefor, may include a unitary, substantially uniformly distributed transfer material coupled to a carrier material.
REFERENCES:
patent: 3541222 (1970-11-01), Kitaguchi et al.
patent: 4008300 (1977-02-01), Ponn
patent: 4466483 (1984-08-01), Whitfield et al.
patent: 4482912 (1984-11-01), Chiba et al.
patent: 4654754 (1987-03-01), Daszkowski
patent: 4869954 (1989-09-01), Squitieri
patent: 5213868 (1993-05-01), Liberty et al.
patent: 5275856 (1994-01-01), Calhoun et al.
patent: 5323294 (1994-06-01), Layton et al.
patent: 5751068 (1998-05-01), McMahon et al.
patent: 5781412 (1998-07-01), de Sorgo
patent: 5783862 (1998-07-01), Deeney
patent: 5945217 (1999-08-01), Hanrahan
patent: 6059579 (2000-05-01), Kresge et al.
patent: 6444496 (2002-09-01), Edwards et al.
patent: 6531770 (2003-03-01), Nakashima
patent: 6815831 (2004-11-01), Dias
patent: 6926955 (2005-08-01), Jayaraman et al.
patent: 6956739 (2005-10-01), Bunyan
patent: 7036573 (2006-05-01), Koning et al.
patent: 7064014 (2006-06-01), Dias et al.
patent: 7078822 (2006-07-01), Dias et al.
patent: 2004/0264138 (2004-12-01), Dias et al.
Dias Rajen C.
Liu Yongmei
Intel Corporation
Lam Cathy F.
Schwegman Lundberg & Woessner, P.A.
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