Thermal cycle resistant seal and method of sealing for use with

Details Thermal cycle resistant seal and method of sealing for use with Thermal cycle resistant seal and method of sealing for use with

1994-05-11

1996-11-19

Wilczewski, Mary

Coating apparatus

Gas or vapor deposition

Chamber seal

29 2501, B21F 4100, C23C 1600

Patent

active

055758568

ABSTRACT:
A semi conductor wafer processing apparatus has a wafer supporting susceptor having a sealing surface, a susceptor drive shaft for connection to the susceptor also having a sealing surface, a seal disposed between the susceptor and drive shaft sealing surfaces having a rigid metallic core and a ductile metallic coating on the core, and fasteners connecting the susceptor to the drive shaft and compressing the seal between the susceptor and drive shaft sealing surfaces. The seal retains sealing capability upon being subjected to changes in temperature.

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K. Trutnovsky "Beruhrungsdichtungen An Ruhenden Bewegten Maschinenteilen" 1975, Springer-Verlag Berlin Heidelberg New York, Berlin.
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