Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1997-09-18
1999-02-23
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
4302881, 4302851, 430311, 430330, 522311, 522330, G03F 7033, G03F 738, G03F 740
Patent
active
058741976
ABSTRACT:
A photosensitive thick film composition comprising an admixture of: (a) finely divided electrically conductive or dielectric particles, dispersed in; (b) an organic medium, comprising: (1) at least one acrylic monomer, (2) a photoinitiation system, (3) a thermal assist catalyst; and (4) an acidic acrylic polymer. The invention is further directed to a single print process for the use thereof.
REFERENCES:
patent: 2760863 (1956-08-01), Plambeck, Jr.
patent: 2850445 (1958-09-01), Oster
patent: 2875047 (1959-02-01), Oster
patent: 3074974 (1963-01-01), Gebura
patent: 3097096 (1963-07-01), Oster
patent: 3097097 (1963-07-01), Oster et al.
patent: 3145104 (1964-08-01), Oster et al.
patent: 3427161 (1969-02-01), Laridon et al.
patent: 3479185 (1969-11-01), Chambers, Jr.
patent: 3549367 (1970-12-01), Chang et al.
patent: 3684771 (1972-08-01), Braun
patent: 3788996 (1974-01-01), Thompson
patent: 4032698 (1977-06-01), Ashe
patent: 4070388 (1978-01-01), Jones
patent: 4162162 (1979-07-01), Dueber
patent: 4613560 (1986-09-01), Dueber et al.
patent: 5006436 (1991-04-01), Hung et al.
patent: 5032478 (1991-07-01), Nebe et al.
patent: 5185385 (1993-02-01), Kanluen et al.
Jakubauskas, Use of A-B Block Polymers . . . , Journal of Coating Technology, 58(736), 71-82, 1986.
E. I. Du Pont de Nemours and Company
Hamilton Cynthia
LandOfFree
Thermal assisted photosensitive composition and method thereof does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Thermal assisted photosensitive composition and method thereof, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thermal assisted photosensitive composition and method thereof will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-305236