Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1986-02-25
1986-12-16
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430954, 430910, 430277, 522 75, 522 95, 522102, 522121, G03C 194, G03C 168
Patent
active
046296794
ABSTRACT:
A photopolymerizable resin composition is described which comprises, (a) 40 to 85 wt. %, based on the composition, of a thermoplastic polymer binder, (b) 15 to 60 wt. %, based on the composition, of a cross-linkable monomer having at least one ethylenically unsaturation, (c) 0.5 to 10 wt. %, based on the total of the binder (a) and the monomer (b), of a photopolymerization initiator, and (d) 0.005 to 1 wt. %, based on the total of the binder (a) and the monomer (b), of a tetrazole compound of the formula: ##STR1## wherein R.sub.1 is H, halogen, methyl, ethyl, phenyl, carboxyl, amino, dimethylamino, diethylamino, methoxy, ethoxy, mercapto or sulfonic acid; and R.sub.2 is H, methyl, ethyl, phenyl, amino or mercapto. The photopolymerization resin composition exhibits an enhanced adhesion to a metal surface, and is useful as a photoresist for fabrication of a printed circuit board.
REFERENCES:
patent: 3622334 (1971-11-01), Hurley
patent: 3645772 (1972-02-01), Jones
patent: 3873316 (1975-03-01), Velten et al.
patent: 4438190 (1984-03-01), Ishimaru et al.
Nakauchi Jun
Uchida Hiroyuki
Hamilton Cynthia
Kittle John E.
Mitsubishi Rayon Company Ltd.
LandOfFree
Tetrazole compound-containing photopolymerizable resin compositi does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Tetrazole compound-containing photopolymerizable resin compositi, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Tetrazole compound-containing photopolymerizable resin compositi will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-244991