Tetraskisazo compound and ink containing the compound

Organic compounds -- part of the class 532-570 series – Organic compounds – Azo

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534666, 534668, 534685, 534806, 106 22K, C09B 3562, C09D 1102

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active

055301053

ABSTRACT:
A tetrakisazo compound represented by the following formula (1) in the free acid form: ##STR1## wherein Q.sub.1 and Q.sub.2 independently represent phenylene or naphthylene group which may be optionally substituted, R.sub.4, R.sub.5 and R.sub.6 independently represent a hydrogen atom, a halogen atom, a hydroxy group, a sulfonic acid group or an amino, alkyl, alkoxy, carbamoyl or sulfamoyl group which may be optionally substituted, m is 0 or 1 and n is 1 or 2, and an ink which comprises the tetrakisazo compound. The ink exhibit excellent properties for ink jet printing.

REFERENCES:
patent: 1901390 (1933-03-01), Fleishhauer et al.
patent: 4395288 (1983-07-01), Eida et al.
patent: 4767459 (1988-08-01), Greenwood et al.
Chemical Abstracts, vol. 112, 42, 1990, abstract No. 112:100883q, Yuichi Kobayashi et al., "Marking ink compositions for impervious substrates".
Chemical Abstracts, vol. 94, 1981, abstract No. 94:158519b, Canon K.K., "Jet-printing inks".
Chemical Abstract, vol. 111, No. 20, 1989, Columbus, Ohio, US; abstract No. 176421n & JP-A-01 048 873 (Ricoh Co Ltd) & Registry (Database, STN) RN: 123366-22-3, 123370-71-8, 123370-73-0, 123370-74-1, 123370-75-2, 123370-76-3.
JP-A-01 048 873 corresponds to Chemical Abstracts, vol. 111, no. 20, 1989 cited above.
Chemical Abstracts, vol. 112, No. 12, 1990, Columbus, Ohio, US; abstract No. 100884r & JP-A-01 141 966 (Ricoh Co Ltd.) & Registry (Database, STN) RN: 125362-39-2.
JP-A-01 141 966 corresponds to Chemical abstracts, vol. 112, No. 12, 1990 cited above.

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